3674/JN - Atomic Layer Deposition (ALD) System

Award outcome

Description

The Department of Physics and Astronomy at The University of Sheffield, requires an atomic layer deposition (ALD) system for the growth of ultra-thin layers of metal oxides on substrates for use in a range of optoelectronic devices. The system needs to be capable of depositing a range of metal oxides (in particular Al2O3, TiO2, SnOx and InOx) onto substrates which are placed on a sample holder with a circular diameter of ~150mm. The predominant use of this system will be to deposit metal oxide layers within metal halide perovskite semiconductor devices. This requires a system which can ensure substrates are held at various temperatures ranging from 50°C to 200°C during deposition. This system shall be used to deposit thin films on substrates of different textures. Therefore, conformality of the resultant films is a key requirement. The instrument needs to be a tabletop instrument and must be cleanroom compatible. This is an open exercise. The ITT can be downloaded by registering and expressing your interest on the University`s e-tendering system https://in-tendhost.co.uk/sheffield If you have any questions or comments in relation to this tender they must be submitted via the In-tend system, this can be accessed at https://in-tendhost.co.uk/sheffield Completed tenders must be returned through the same e-tendering system.

Links & Documents

About UNIVERSITY OF SHEFFIELD

Published contracts in the last 12 months

Similar contracts